Chemical and electrical characterization of the HfO2/InAlAs interface

Barry Brennan; Rohit V Galatage; K Thomas; Emanuele Pelucchi; Paul K Hurley; Jiyoung Kim; Christopher L Hinkle; Eric M Vogel; Robert M Wallace

Chemical and electrical characterization of the HfO2/InAlAs interface

Barry Brennan, Rohit V Galatage, K Thomas, Emanuele Pelucchi, Paul K Hurley, Jiyoung Kim, Christopher L Hinkle, Eric M Vogel, Robert M Wallace

Sligo Research Office

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Original language	Undefined/Unknown
Journal	Journal of Applied Physics
Volume	114
Issue number	10
Publication status	Published - 2013

Cite this

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title = "Chemical and electrical characterization of the HfO2/InAlAs interface",

author = "Barry Brennan and Galatage, {Rohit V} and K Thomas and Emanuele Pelucchi and Hurley, {Paul K} and Jiyoung Kim and Hinkle, {Christopher L} and Vogel, {Eric M} and Wallace, {Robert M}",

year = "2013",

language = "Undefined/Unknown",

volume = "114",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "AIP Publishing",

number = "10",

}

TY - JOUR

T1 - Chemical and electrical characterization of the HfO2/InAlAs interface

AU - Brennan, Barry

AU - Galatage, Rohit V

AU - Thomas, K

AU - Pelucchi, Emanuele

AU - Hurley, Paul K

AU - Kim, Jiyoung

AU - Hinkle, Christopher L

AU - Vogel, Eric M

AU - Wallace, Robert M

PY - 2013

Y1 - 2013

M3 - Article

SN - 0021-8979

VL - 114

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

ER -