Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing

W Cabrera; B Brennan; Hong Dong; Terrance P O'Regan; Ian M Povey; Scott Monaghan; Éamon O'Connor; Paul K Hurley; Robert M Wallace; YJ Chabal

Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing

W Cabrera, B Brennan, Hong Dong, Terrance P O'Regan, Ian M Povey, Scott Monaghan, Éamon O'Connor, Paul K Hurley, Robert M Wallace, YJ Chabal

Sligo Research Office

Research output: Contribution to journal › Article › peer-review

Original language	Undefined/Unknown
Journal	Applied Physics Letters
Volume	104
Issue number	1
Publication status	Published - 2014

Cite this

@article{4947ea1b1cdf4a11a485dc20b8acb061,

title = "Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing",

author = "W Cabrera and B Brennan and Hong Dong and O'Regan, {Terrance P} and Povey, {Ian M} and Scott Monaghan and {\'E}amon O'Connor and Hurley, {Paul K} and Wallace, {Robert M} and YJ Chabal",

year = "2014",

language = "Undefined/Unknown",

volume = "104",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "AIP Publishing",

number = "1",

}

TY - JOUR

T1 - Diffusion of In0. 53Ga0. 47As elements through hafnium oxide during post deposition annealing

AU - Cabrera, W

AU - Brennan, B

AU - Dong, Hong

AU - O'Regan, Terrance P

AU - Povey, Ian M

AU - Monaghan, Scott

AU - O'Connor, Éamon

AU - Hurley, Paul K

AU - Wallace, Robert M

AU - Chabal, YJ

PY - 2014

Y1 - 2014

M3 - Article

SN - 0003-6951

VL - 104

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

ER -