HfO2 on MoS2 by atomic layer deposition: adsorption mechanisms and thickness scalability

Stephen McDonnell; Barry Brennan; Angelica Azcatl; Ning Lu; Hong Dong; Creighton Buie; Jiyoung Kim; Christopher L Hinkle; Moon J Kim; Robert M Wallace

HfO2 on MoS2 by atomic layer deposition: adsorption mechanisms and thickness scalability

Stephen McDonnell, Barry Brennan, Angelica Azcatl, Ning Lu, Hong Dong, Creighton Buie, Jiyoung Kim, Christopher L Hinkle, Moon J Kim, Robert M Wallace

Sligo Research Office

Research output: Contribution to journal › Article › peer-review

269 Citations (Scopus)

Original language	Undefined/Unknown
Pages (from-to)	10354-10361
Number of pages	8
Journal	ACS Nano
Volume	7
Issue number	11
Publication status	Published - 2013

Cite this

@article{f72d39aaed244ec8a54a301e240fe294,

title = "HfO2 on MoS2 by atomic layer deposition: adsorption mechanisms and thickness scalability",

author = "Stephen McDonnell and Barry Brennan and Angelica Azcatl and Ning Lu and Hong Dong and Creighton Buie and Jiyoung Kim and Hinkle, {Christopher L} and Kim, {Moon J} and Wallace, {Robert M}",

year = "2013",

language = "Undefined/Unknown",

volume = "7",

pages = "10354--10361",

journal = "ACS Nano",

issn = "1936-0851",

publisher = "American Chemical Society",

number = "11",

}

TY - JOUR

T1 - HfO2 on MoS2 by atomic layer deposition: adsorption mechanisms and thickness scalability

AU - McDonnell, Stephen

AU - Brennan, Barry

AU - Azcatl, Angelica

AU - Lu, Ning

AU - Dong, Hong

AU - Buie, Creighton

AU - Kim, Jiyoung

AU - Hinkle, Christopher L

AU - Kim, Moon J

AU - Wallace, Robert M

PY - 2013

Y1 - 2013

M3 - Article

SN - 1936-0851

VL - 7

SP - 10354

EP - 10361

JO - ACS Nano

JF - ACS Nano

IS - 11

ER -