| Original language | Undefined/Unknown |
|---|---|
| Journal | Applied Physics Letters |
| Volume | 95 |
| Issue number | 7 |
| Publication status | Published - 2009 |
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High resolution photoemission study of SiOx/Si (111) interface disruption following in situ HfO2 deposition
- Stephen McDonnell
- , Barry Brennan
- , Greg Hughes
Research output: Contribution to journal › Article › peer-review
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