High resolution photoemission study of SiOx/Si (111) interface disruption following in situ HfO2 deposition

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@article{71241bec0ae3442f9742cd60f5628b57,

title = "High resolution photoemission study of SiOx/Si (111) interface disruption following in situ HfO2 deposition",

author = "Stephen McDonnell and Barry Brennan and Greg Hughes",

year = "2009",

language = "Undefined/Unknown",

volume = "95",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "AIP Publishing",

number = "7",

}