| Original language | Undefined/Unknown |
|---|---|
| Journal | Applied Physics Letters |
| Volume | 102 |
| Issue number | 17 |
| Publication status | Published - 2013 |
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In situ study of HfO2 atomic layer deposition on InP (100)
- Hong Dong
- , B Brennan
- , Dmitry M Zhernokletov
- , Jiyoung Kim
- , Christopher L Hinkle
- , Robert M Wallace
Research output: Contribution to journal › Article › peer-review
22
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(Scopus)