In situ study of the role of substrate temperature during atomic layer deposition of HfO<inf>2</inf> on InP

Hong Dong; K.C. Santosh; X. Qin; B. Brennan; Stephen McDonnell; Dmitry M Zhernokletov; C.L. Hinkle; Jiyoung Kim; K. Cho; R.M. Wallace

doi:10.1063/1.4825218

In situ study of the role of substrate temperature during atomic layer deposition of HfO<inf>2</inf> on InP

Hong Dong, K.C. Santosh, X. Qin, B. Brennan, Stephen McDonnell, Dmitry M Zhernokletov, C.L. Hinkle, Jiyoung Kim, K. Cho, R.M. Wallace

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Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Original language	Undefined/Unknown
Journal	Journal of Applied Physics
DOIs	https://doi.org/10.1063/1.4825218
Publication status	Published - 2013

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title = "In situ study of the role of substrate temperature during atomic layer deposition of HfO2 on InP",

author = "Hong Dong and K.C. Santosh and X. Qin and B. Brennan and Stephen McDonnell and Zhernokletov, {Dmitry M} and C.L. Hinkle and Jiyoung Kim and K. Cho and R.M. Wallace",

year = "2013",

doi = "10.1063/1.4825218",

language = "Undefined/Unknown",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "AIP Publishing",

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TY - JOUR

T1 - In situ study of the role of substrate temperature during atomic layer deposition of HfO2 on InP

AU - Dong, Hong

AU - Santosh, K.C.

AU - Qin, X.

AU - Brennan, B.

AU - McDonnell, Stephen

AU - Zhernokletov, Dmitry M

AU - Hinkle, C.L.

AU - Kim, Jiyoung

AU - Cho, K.

AU - Wallace, R.M.

PY - 2013

Y1 - 2013

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-84886516420&partnerID=MN8TOARS

U2 - 10.1063/1.4825218

DO - 10.1063/1.4825218

M3 - Article

SN - 0021-8979

JO - Journal of Applied Physics

JF - Journal of Applied Physics

ER -

In situ study of the role of substrate temperature during atomic layer deposition of HfO<inf>2</inf> on InP

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