In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition

DM Zhernokletov, H Dong, B Brennan, Jiyoung Kim, Robert M Wallace

Research output: Contribution to journal › Article › peer-review

Cite this

@article{12eb09b1b77d47fea2cdecea457ccc40,

title = "In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition",

author = "DM Zhernokletov and H Dong and B Brennan and Jiyoung Kim and Wallace, {Robert M}",

year = "2012",

language = "Undefined/Unknown",

volume = "258",

pages = "5522--5525",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "North-Holland",

number = "14",

}

TY - JOUR

T1 - In situ X-ray photoelectron spectroscopy characterization of Al2O3/InSb interface evolution from atomic layer deposition

AU - Zhernokletov, DM

AU - Dong, H

AU - Brennan, B

AU - Kim, Jiyoung

AU - Wallace, Robert M

PY - 2012

Y1 - 2012

M3 - Article

SN - 0169-4332

VL - 258

SP - 5522

EP - 5525

JO - Applied Surface Science

JF - Applied Surface Science

IS - 14

ER -