In-situ X-ray photoelectron spectroscopy of trimethyl aluminum and water half-cycle treatments on HF-treated and O3-oxidized GaN substrates

Prasanna Sivasubramani, Tae Joo Park, Brian E Coss, Antonio Lucero, Jie Huang, Barry Brennan, Yu Cao, Debdeep Jena, Huili Xing, Robert M Wallace

Research output: Contribution to journalArticlepeer-review

Original languageUndefined/Unknown
Pages (from-to)22-24
Number of pages3
Journalphysica status solidi (RRL)--Rapid Research Letters
Volume6
Issue number1
Publication statusPublished - 2012

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