Interfacial graphene growth in the Ni/SiO2 system using pulsed laser deposition

Gautam K Hemani; William G Vandenberghe; Barry Brennan; Yves J Chabal; Amy V Walker; Robert M Wallace; Manuel Quevedo-Lopez; Massimo V Fischetti

Interfacial graphene growth in the Ni/SiO2 system using pulsed laser deposition

Gautam K Hemani
, William G Vandenberghe
, Barry Brennan
, Yves J Chabal
, Amy V Walker
, Robert M Wallace
, Manuel Quevedo-Lopez
, Massimo V Fischetti

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Original language	Undefined/Unknown
Journal	Applied Physics Letters
Volume	103
Issue number	13
Publication status	Published - 2013

Cite this

@article{27353d8f23914caf9c417a486a69a788,

title = "Interfacial graphene growth in the Ni/SiO2 system using pulsed laser deposition",

author = "Hemani, \{Gautam K\} and Vandenberghe, \{William G\} and Barry Brennan and Chabal, \{Yves J\} and Walker, \{Amy V\} and Wallace, \{Robert M\} and Manuel Quevedo-Lopez and Fischetti, \{Massimo V\}",

year = "2013",

language = "Undefined/Unknown",

volume = "103",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "AIP Publishing",

number = "13",

}

TY - JOUR

T1 - Interfacial graphene growth in the Ni/SiO2 system using pulsed laser deposition

AU - Hemani, Gautam K

AU - Vandenberghe, William G

AU - Brennan, Barry

AU - Chabal, Yves J

AU - Walker, Amy V

AU - Wallace, Robert M

AU - Quevedo-Lopez, Manuel

AU - Fischetti, Massimo V

PY - 2013

Y1 - 2013

M3 - Article

SN - 0003-6951

VL - 103

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 13

ER -