Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems

Stephen McDonnell; H Dong; JM Hawkins; B Brennan; Marko Milojevic; FS Aguirre-Tostado; DM Zhernokletov; CL Hinkle; Jiyoung Kim; Robert M Wallace

Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems

Stephen McDonnell
, H Dong
, JM Hawkins
, B Brennan
, Marko Milojevic
, FS Aguirre-Tostado
, DM Zhernokletov
, CL Hinkle
, Jiyoung Kim
, Robert M Wallace

Sligo Research Office

Research output: Contribution to journal › Article › peer-review

49 Citations (Scopus)

Original language	Undefined/Unknown
Journal	Applied Physics Letters
Volume	100
Issue number	14
Publication status	Published - 2012

Cite this

@article{9188e6131c1b47aca6cfd2741bebd1bd,

title = "Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems",

author = "Stephen McDonnell and H Dong and JM Hawkins and B Brennan and Marko Milojevic and FS Aguirre-Tostado and DM Zhernokletov and CL Hinkle and Jiyoung Kim and Wallace, \{Robert M\}",

year = "2012",

language = "Undefined/Unknown",

volume = "100",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "AIP Publishing",

number = "14",

}

TY - JOUR

T1 - Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems

AU - McDonnell, Stephen

AU - Dong, H

AU - Hawkins, JM

AU - Brennan, B

AU - Milojevic, Marko

AU - Aguirre-Tostado, FS

AU - Zhernokletov, DM

AU - Hinkle, CL

AU - Kim, Jiyoung

AU - Wallace, Robert M

PY - 2012

Y1 - 2012

M3 - Article

SN - 0003-6951

VL - 100

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 14

ER -