| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 4189-4195 |
| Number of pages | 7 |
| Journal | IEEE transactions on electron devices |
| Volume | 58 |
| Issue number | 12 |
| Publication status | Published - 2011 |
Investigation of Tunneling Current in $$hbox $$SiO$$ $$2$$/$hbox $$HfO$$ $$2$$ $ Gate Stacks for Flash Memory Applications
- Bhaswar Chakrabarti
- , Heesoo Kang
- , Barry Brennan
- , Tae Joo Park
- , Kurtis D Cantley
- , Adam Pirkle
- , Stephen McDonnell
- , Jiyoung Kim
- , Robert M Wallace
- , Eric M Vogel
Research output: Contribution to journal › Article › peer-review