Surface and interfacial reaction study of half cycle atomic layer deposited Al2O3 on chemically treated InP surfaces

Barry Brennan, Hong Dong, Dmitry Zhernokletov, Jiyoung Kim, Robert M Wallace

Research output: Contribution to journal › Article › peer-review

Cite this

@article{a08b688afecc432491b00a7bae8369ad,

title = "Surface and interfacial reaction study of half cycle atomic layer deposited Al2O3 on chemically treated InP surfaces",

author = "Barry Brennan and Hong Dong and Dmitry Zhernokletov and Jiyoung Kim and Wallace, \{Robert M\}",

year = "2011",

language = "Undefined/Unknown",

volume = "4",

pages = "125701",

journal = "Applied Physics Express",

publisher = "IOP Publishing",

number = "12",

}