| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 429-443 |
| Number of pages | 15 |
| Journal | IEEE Transactions on Device and Materials Reliability |
| Volume | 13 |
| Issue number | 4 |
| Publication status | Published - 2013 |
The Characterization and Passivation of Fixed Oxide Charges and Interface States in the $$hbox $$Al$$ $$2$$$hbox $$O$$ $$3$$/$hbox $$InGaAs$$ $ MOS System
Paul K Hurley, Éamon O'Connor, Vladimir Djara, Scott Monaghan, Ian M Povey, Rathnait D Long, Brendan Sheehan, Jun Lin, Paul C McIntyre, Barry Brennan
Research output: Contribution to journal › Article › peer-review