@inproceedings{ee5611a9f18e4356afcc91d305f6bee5,
title = "Tin ion and neutral dynamics within an LPP EUV source",
abstract = "The life-time of normal incidence collectors used in LPP EUV sources has been computationally investigated. A two-dimensional/ axisymmetric hydrodynamic-particle code is used to model the plasma expansion from the laser-droplet interaction up to the collector optic. The plasma is formed from the interaction of a Nd:YAG laser, operating at the fundamental frequency, with 50μm tin droplets. The simulation results show non-uniform mass-density distributions at the end of the laser pulse. As the expansion continues up to the collector, the non-uniformities continue to develop. Sn5+ is the most energetic ion impinging on the collector, with kinetic energies up to 7keV. The sputtering yields for Sn ions onto Mo and Si show a strong dependence on both the ion energy and their impact angle. The deposition of neutral tin atoms on the collector has also been assessed with a large scale hydrodynamic simulation. These results are used to investigate the build-up of tin vapor at the irradiation site.",
keywords = "EUV source, atomic physics, computational, hydrodynamics, laser plasma, lithography",
author = "Bob Rollinger and Oran Morris and Ndaona Chokani and Abhari, {Reza S.}",
year = "2010",
doi = "10.1117/12.846557",
language = "English",
isbn = "9780819480507",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Extreme Ultraviolet (EUV) Lithography",
note = "Extreme Ultraviolet (EUV) Lithography ; Conference date: 22-02-2010 Through 25-02-2010",
}